Development of a light sensitive material containing diazo...

Details Development of a light sensitive material containing diazo... Development of a light sensitive material containing diazo...

G - Physics

03

F

96/269, 96/60

G03F 7/32 (2006.01)

Patent

CA 1188144

ABSTRACT OF THE DISCLOSURE A developer comprising a surfactant, an organic solvent, an alkali agent of about 0.01 to 5 wt% of a water- softening agent having a sequestering ratio of at least 50% at the pH of the developer and water to remove the unexposed area of said photosensitive layer, and a method of develop- ment comprising imagewise exposing a photosensitive material comprising a support having thereon a light-hardenable photosensitive layer including an organic high-molecular polymer with an acid value of 10 to 200, and processing the photosensitive material with the developer.

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