Development of exposed lith-emulsions

Details Development of exposed lith-emulsions Development of exposed lith-emulsions

G - Physics

03

C

96/112

G03C 5/30 (2006.01) G03C 1/043 (2006.01) G03C 1/09 (2006.01) G03C 1/28 (2006.01)

Patent

CA 1057556

ABSTRACT OF THE DISCLOSURE An exposed lith-type silver halide emulsion containing at least 50 mole % of silver chloride, at least about 5 mole % of silver bromide and from 0 to 5 mole % of silver iodide is developed in the presence of a sulphonium compound correspond- ing to the formula : Image wherein : each of X1 and X2 represents an alkyl group at least one of which carries a hydroxy, carboxy, sulpho or cyano group, R represents an alkyl group, an aryl group or the group Image wherein A is a divalent organic group, or R may represent hydrogen when both X1 and X2 are hydroxyalkyl, n is an integer of at least 1 when the compound is a disulphonium compound and is an integer of at least 2 when the compound is a monosulphonium compound, and Z is an anion but does not exist when one of X1 and X2 itself contains an anionic group. By the presence of the sulphonium compound the initial rate of development is increased, high development latitude is obtained and screened images of high dot sharpness and improved dot quality are formed.

221090

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