Development of light-sensitive quinone diazide compositions...

Details Development of light-sensitive quinone diazide compositions... Development of light-sensitive quinone diazide compositions...

G - Physics

03

C

96/266

G03C 1/58 (2006.01) G03F 7/32 (2006.01)

Patent

CA 1110903

DEVELOPMENT OF LIGHT-SENSITIVE QUINONE DIAZIDE COMPOSITIONS Abstract of the Disclosure Light-sensitive compositions containing a quinone diazide which are useful in positive-working photoresists and positive-working lithographic printing plates are developed with a developing composition comprising methyltriethanol ammonium hydroxide. The developing composition provides the advantage that it is free of metal ions and, accordingly. does not contaminate the surface of the image. It is additionally advantageous in that it provides extended development latitude, increased exposure latitude, improved resist contrast, improved prebake latitude, a low depletion rate and minimal loss of image layer thickness. -1-

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