Development of radiation sensitive compositions

Details Development of radiation sensitive compositions Development of radiation sensitive compositions

G - Physics

03

G

96/54

G03G 9/12 (2006.01)

Patent

CA 2001174

ABSTRACT Development of Radiation Sensitive Compositions Image-wise exposed radiation sensitive compositions are processed using a developer liquid comprising an ethyl hexyl sulphate. The developer liquid may additionally include a surface active agent such as a polyoxyethylene lauryl ether or an ethylene oxide/propylene oxide condensate of poly(ethylene) glycol, an alkaline material such as sodium metasilicate, a water soluble carboxylic acid salt such as sodium octanoate, and the sodium salt of ethylene diamine tetra acetic acid. Such developer liquids can be formulated for use with either positive-working or negative-working plates.

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