Device and method for spinous process distraction

A - Human Necessities – 61 – B

Patent

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Details

A61B 17/70 (2006.01)

Patent

CA 2693206

An implant for maintaining a given minimum inter-spinous-process spacing includes an implant body with a number of segments hingedly interconnected so as to assume a straightened state for delivery along a conduit and a curved deployed state. An elongated tightening element is anchored at the distal segment of the implant body and passes along a channel extending along the implant body. Tension applied to the tightening element biases the implant body from the straightened state to the curved deployed state. Preferably, when the tightening element is deflected to reach the curved deployed state, a locking arrangement locks the tightening element relative to the implant body, thereby retaining the implant in the curved deployed state. A distal portion of the implant body is preferably formed with a set of lateral projections to inhibit withdrawal of the distal portion between adjacent spinous processes after deployment.

La présente invention concerne un implant destiné à maintenir un espacement interapophyses épineuses minimal donné, comprenant un corps d'implant comportant un certain nombre de segments articulés, ce qui lui permet de prendre une forme redressée pour la mise en place par passage le long d'un conduit et une forme déployée incurvée. Un élément raidisseur allongé est fixé au niveau du segment distal du corps d'implant et passe le long d'un canal se prolongeant le long du corps d'implant. Une tension appliquée à l'élément raidisseur fait passer le corps d'implant de l'état redressé à l'état déployé incurvé. Lorsque l'élément raidisseur se courbe en arc pour atteindre l'état déployé incurvé, un dispositif de verrouillage verrouille, de préférence, l'élément raidisseur au corps d'implant, ce qui maintient l'implant dans l'état déployé incurvé. Une partie distale du corps d'implant comporte, de préférence, un ensemble de projections latérales afin d'inhiber le retrait de la partie distale entre des apophyses épineuses adjacentes après le déploiement.

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