Device and process for the embossing of fine structures

Details Device and process for the embossing of fine structures Device and process for the embossing of fine structures

B - Operations, Transporting

44

B

101/2

B44B 5/00 (2006.01) B21H 7/00 (2006.01) B29C 59/04 (2006.01) B41F 13/04 (2006.01) B44B 5/02 (2006.01)

Patent

CA 2026027

ABSTRACT OF THE INVENTION A device for embossing a set of motifs having a predetermined motif interval onto a length of film utilizes a rotating embossing cylinder which is provided with a recess for the attachment of an embossing matrix. The embossing matrix has a usable length which is less than the entire circumference of the embossing cylinder hut more than 50% of the circumference of the embossing cylinder. A rotating counterpressure cylinder is positioned adjacent the embossing cylinder, such that the film advances between the counterpressure cylinder and the embossing cylinder for embossing said motifs from said embossing matrix onto the film and for defining a free phase during each rotation of the embossing cylinder when the recess is positioned adjacent the film. The device also comprises movement means for providing an additional relative movement between the length of film and the embossing matrix during each free phase of the embossing cylinder. A control mechanism determines the amplitude of the additional relative movement in accordance with the motif interval. It is a significant advantage of the present invention that the embossing cylinder circumference is independent of the motif interval thus allowing for easy change of the embossing matrix.

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