Device fabrication entailing plasma-derived x-ray delineation

H - Electricity – 01 – L

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H01L 21/027 (2006.01) G03F 7/20 (2006.01) G21K 1/06 (2006.01)

Patent

CA 2121819

Submicron device fabrication entailing ringfield x-ray pattern delineation is facilitated by use of a condenser including a faceted collector lens. The collector lens is constituted of paired facets, symmetrically placed about an axis of a laser-pumped plasma source. Each of the members of a pair produce an image of the entire illumination field so that inhomogeneities in illumination intensity are compensated within each composite image as produced by a particular pair.

La fabrication de dispositifs submicroniques faisant appel à la délimitation de structures de rayons X en champs annulaires est facilitée par l'utilisation d'un condensateur à lentille collectrice à facettes. Celle-ci est constituée de facettes jumelées, disposées symétriquement autour d'un axe d'une source de plasma pompé par laser. Chaque élément d'une paire produit une image de l'ensemble du champ d'illumination de sorte que les non-homogénéités dans l'intensité de l'illumination sont compensées à l'intérieur de chaque image composite produite par une paire particulière.

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