Device fabrication using gas-solid processes

C - Chemistry – Metallurgy – 30 – B

Patent

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Details

204/96.05, 148/2

C30B 25/16 (2006.01) C23C 16/52 (2006.01) C23F 4/00 (2006.01) G01N 21/64 (2006.01)

Patent

CA 1194385

Abstract of the Disclosure This invention concerns with fabricating devices using gas phase processes such as gas etching and chemical vapor deposition. The gas-phase processes may be accurately monitored and adjusted via an induced fluorescence. The gaseous phase used in the process to be monitored is probed by excitation with a suitable energy source. The emission from the gas phase induced through this excitation is then monitored and yields an accurate measure of concentration of the active species present. In turn the conditions of the fabrication process are adjusted based on these discerned concentrations.

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