C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
C25D 5/00 (2006.01) C25D 17/00 (2006.01) H05K 3/24 (2006.01)
Patent
CA 2076365
ABSTRACT The invention builds on an arrangement for the masking of field lines in an electroplating plant for the treatment of essentially plate-shaped workpieces, which are loaded into the bath suspended from a workpiece holder, wherein a mask is provided which is vertically adjustably guided on the plating tank. To permit the vertical adjustment of the mask regardless of the shape and, in particular, the thickness of the workpiece to be treated, as well as the manner in which the workpiece is held on the workpiece holder, and further, so that said mask(s) can optionally mask the lower or the upper area of the workpiece(s) to be treated, a hold-down clamp (21) is provided, attached to the workpiece holder (6) in such a way as to be height- adjustable and lockable in the particular position, and moves the masks (12, 13; 14, 15) located laterally to the workpieces (5) into a preselected position as the workpiece holder (6) is loaded into the treatment station (1).
Kauper Rudolf
Wilhelm Gerhard
Atotech Deutschland Gmbh
Marks & Clerk
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