Device for providing high-intensity ion or electron beam

Details Device for providing high-intensity ion or electron beam Device for providing high-intensity ion or electron beam

H - Electricity

01

J

204/167.4

H01J 37/34 (2006.01) C23C 14/35 (2006.01) H01J 27/20 (2006.01) H01J 37/06 (2006.01) H01J 37/08 (2006.01)

Patent

CA 1072913

ABSTRACT OF THE DISCLOSURE A thin film of a low-thermionic-work-function material is maintained on the cathode of a device for producing a high-current, low-pressure gas discharge by means of sputter deposition from an auxiliary electrode. The auxiliary electrode includes a surface with a low-work- function material, such as thorium, uranium, plutonium or one of the rare earth elements, facing the cathode but at a disposition and electrical potential so as to extract ions from the gas discharge and sputter the low-work-function material onto the cathode. By continuously replenishing the cathode film, high thermionic emissions and ion plasmas can be realized and maintained over extended operating periods.

275725

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