Device for treating flat substrates by a corona station

H - Electricity – 01 – T

Patent

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Details

H01T 19/00 (2006.01) B29C 59/12 (2006.01)

Patent

CA 2232567

The invention relates to a device for treating flat substrates by a corona station (11) consisting of at least one electrode (12) which can be connected to a high-voltage supply via connector (24), a housing device (23) accommodating the electrode and its connector, at least one counter-electrode (13), at least one device with at least one supply device (27) and at least one extractor (41) to generate a gas flow and essentially having a directing component to the counter-electrode (13) and guidable along the flat substrate between the electrode (12) and the counter-electrode (13), in which the counter-electrode (13) takes the form of a roller and the flat substrate bears on the counter-electrode (13) and is deflected and taken from a supply device into a direction differing from the supply direction. At least one extraction device (41) is adjustable from the path of the flat substrate.

L'invention concerne un dispositif de traitement de substrats plats dans une station à décharges corona (11). Ledit dispositif est constitué d'au moins une électrode (12) raccordable à une alimentation haute tension par un connecteur (24), d'un boîtier (23) qui renferme au moins partiellement l'électrode ainsi que son connecteur, d'au moins une contre-électrode (13), d'au moins un dispositif pourvu d'au moins un dispositif d'amenée (27) et d'au moins un dispositif d'aspiration (41) pour produire un flux de gaz, lequel présente essentiellement un composant d'orientation vers la contre-électrode (13) et le substrat plat peut être guidé entre l'électrode (12) et la contre-électrode (13), la contre-électrode (13) étant conçue sous forme de rouleau et le substrat plat reposant contre la contre-électrode (13) et étant dévié de la direction d'amenée et emmené, par un dispositif d'amenée, dans une direction autre que la direction d'amenée. Au moins un dispositif d'aspiration (41) est réglable à partir du défilement de la bande de substrat plat.

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