Device manufacture involving lithographic processing

Details Device manufacture involving lithographic processing Device manufacture involving lithographic processing

H - Electricity

01

L

356/177

H01L 21/469 (2006.01) G03F 7/20 (2006.01) H01J 37/317 (2006.01) H01L 21/027 (2006.01)

Patent

CA 2020237

- 39 - Abstract Fabrication of devices of micron and submicron minimum feature size is accomplished by lithographic processing involving a back focal plane filter. A particularly important fabrication approach depends upon mask patterns which produce images based on discrimination as between scattered and unscattered radiation by accelerated electrons.

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