Device manufacturing involving step-and-scan delineation

Details Device manufacturing involving step-and-scan delineation Device manufacturing involving step-and-scan delineation

G - Physics

03

F

G03F 1/14 (2006.01) G03F 1/16 (2006.01) G03F 7/20 (2006.01) H01J 37/305 (2006.01) H01L 21/027 (2006.01)

Patent

CA 2083112

Fabrication of submicron design rule large scale integrated circuits depends upon use of a strut-segmented mask With struts providing mechanical support to permit thinned mask segments consequently yielding improved resolution. "Stitching" - positioning of projected segment images to yield a satisfactory continuous image - is aided by lithographically defined skirts forming a continuous border within strut- supported segments.

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