Device, system, and method for epithelium protection during...

A - Human Necessities – 61 – B

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A61B 18/18 (2006.01)

Patent

CA 2610339

A system (100) includes a light source (106) operable to generate light energy (218) for a cornea reshaping procedure. The system (100) also includes a device (102) operable to be attached to an eye (104) having a cornea (204). The device (102) includes a window (210) operable to contact at least a portion of the cornea (204). The window (210) is substantially transparent to the light energy (218) that irradiates the cornea (204) during the cornea reshaping procedure. The window (210) is also operable to cool at least a portion of a corneal epithelium in the cornea (204) during the cornea reshaping procedure. The window (210) may be operable to prevent clinically significant damage to the corneal epithelium during the cornea reshaping procedure. The window (210) may be operable to prevent a temperature of the corneal epithelium from exceeding a damage threshold temperature during the cornea reshaping procedure, such as a damage threshold temperature of approximately 70~C.

L'invention concerne un système (100) qui comprend une source de lumière (106) conçue pour générer de l'énergie lumineuse (218) pour une procédure de reformation de la cornée. Ce système (100) comprend également un dispositif (102) conçu pour être fixé à un oeil (104) doté d'une cornée (204). Le dispositif (102) comprend une fenêtre (210) conçue pour contacter au moins une partie de la cornée (204). La fenêtre (210) est sensiblement transparente à l'énergie lumineuse (218) qui irradie la cornée (204) pendant la procédure de reformation de la cornée. La fenêtre (210) est également conçue pour refroidir au moins une partie de l'épithélium pendant la procédure de reformation de la cornée. La fenêtre (210) peut être conçue pour prévenir des lésions, importantes sur le plan clinique, de l'épithélium cornéen pendant la procédure de reformation de la cornée et pour empêcher la température de l'épithélium cornéen de dépasser une température limite de lésion pendant la procédure de reformation de la cornée, telle qu'une température d'environ 70°C.

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