Device, system and method for the surface treatment of...

B - Operations – Transporting – 05 – C

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Details

B05C 1/02 (2006.01) B05C 1/08 (2006.01) B05C 1/10 (2006.01) H05K 3/00 (2006.01) B05C 1/16 (2006.01) B05C 13/02 (2006.01)

Patent

CA 2632912

The invention relates to a device (1, 1') for treating the surfaces of silicon wafers (2), com-prising transport rollers (3) for transporting the silicon wafers (2) on a transport plane (5) which is determined by the transport rollers (3), and at least one conveyor device (3a) which wets the silicon wafer (2) with an aqueous process medium (10). The conveyor de-vice (3a) is arranged in such a manner below the transport plane (5) that it touches the transport plane for wetting the substrate surface, which is oriented in the downward direc-tion, with a process medium (10). Said conveyor device is in direct contact with the sub-strate surface.

L'invention concerne un dispositif (1, 1') de traitement de surface de tranches de silicium (2), ce dispositif comportant des rouleaux transporteurs (3), pour déplacer les tranches de silicium (2) sur un plan de transport (5) déterminé par les rouleaux transporteurs (3), et au moins une installation (3a) de transport conçue pour le mouillage de la tranche de silicium (2) au moyen d'un agent de traitement (10) liquide. L'installation (3a) de transport se trouve sous le plan de transport (5) de manière à le toucher pour le mouillage de la surface du substrat tournée vers le bas au moyen de l'agent de traitement (10), l'installation de transport étant en contact direct avec la surface du substrat.

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