C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/226, 260/271
C07D 217/16 (2006.01) C07D 221/10 (2006.01) C07D 405/00 (2006.01) C07D 491/04 (2006.01) C07D 491/056 (2006.01) C07D 498/14 (2006.01) C07D 513/14 (2006.01) C07D 515/14 (2006.01)
Patent
CA 1330560
ABSTRACT Novel di- and tetrahydroisoquinoline derivatives of the general formula Image (I) wherein all substituents may be, for example, hydrogen atoms or R5 and R6 may together constitute a double bond. The compounds have good cytostatic properties and are useful for the preparation of cytostatic pharmaceutical compositions.
537195
Hes Roelof Van
Hulkenberg Antonius
Keet Christophorus M. J. F.
Van Der Eycken Johan T. A.
Van Wijngaarden Ineke
Duphar International Research B.v.
Fetherstonhaugh & Co.
LandOfFree
Di- and tetrahydroisoquinoline derivatives does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Di- and tetrahydroisoquinoline derivatives, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Di- and tetrahydroisoquinoline derivatives will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1334804