C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/550.5, 260/4
C07C 55/26 (2006.01) C07C 45/46 (2006.01) C07C 51/305 (2006.01) C07C 57/38 (2006.01) C07C 57/42 (2006.01) C07C 69/76 (2006.01)
Patent
CA 1110267
ABSTRACT OF THE DISCLOSURE The invention relates to novel compounds of general formula I: Image I and the pharmaceutically acceptable salts, esters and amides thereof, in which R1 and R2 represent hydrogen, alkyl or alkenyl (1-4 C), R3 represents hydrogen, halogen, hydroxy, alkyl (1-4 C) or alkoxy (1-4 C), n has the value 0, 1 or 2 and ALK is a saturated or unsaturated hydrocarbon radical with 3-12 carbon atoms, in which a straight carbon chain in between the benzene rings is present, containing 3-8 carbon atoms, and the dotted line indicates an optional extra bond between the first and second carbon counted from the phenyl ring, in case of an extra bond the group R2 and one hydrogen attached to said second carbon being absent, having valuable hypocholesterolaemic and hypotrigly- ceriolaemic properties.
262807
Campbell Alexander C.
Hewett Colin L.
Zeelen Filippus J.
Akzona Incorporated
Fetherstonhaugh & Co.
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