C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
167/233, 167/262
C07C 59/68 (2006.01) C07C 65/24 (2006.01) C07D 257/04 (2006.01) C07D 257/06 (2006.01)
Patent
CA 1325430
ABSTRACT OF THE DISCLOSURE: Disclosed are novel compounds of the formula: Image wherein A is phenylene or an alkylene group containing two to about seven carbon atoms; and B is carboxyl, tetrazolyl or carboxamidetetrazolyl; or a derivative of a compound wherein B is carboxyl selected from the group consisting of lower alkyl ester, a (lower)alkylamino(lower)alkyl ester, a pharmaceutically acceptable (lower)alkylamino(lower)alkyl ester acid-addition salt and a pharmaceutically acceptable carboxylate salt; or a derivative of a compound wherein B is tetrazolyl or carboxamidotetrazolyl selected from a pharmaceutically acceptable alkali metal or alkaline earth salt of the tetrazolyl moiety. These novel compounds are useful as antiallergic agents. Synthetic intermediates for making such compounds are also disclosed.
564299
Riker Laboratories Inc.
Robic
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