C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 229/60 (2006.01) C07C 69/76 (2006.01) C07C 235/84 (2006.01) C07C 237/30 (2006.01) C07C 317/44 (2006.01) C07C 323/62 (2006.01) C08F 122/40 (2006.01) C08F 126/02 (2006.01) C08G 73/10 (2006.01) C08L 35/00 (2006.01) G03F 7/038 (2006.01)
Patent
CA 2069348
Case 6366 RDF/dka 5/15/91 Abstract of the Disclosure NOVEL DIAMINES AND PHOTOSENSITIVE POLYIMIDES MADE THEREFROM Disclosed is an aromatic diamine having the general formula Image where A is a group containing at least one aromatic ring, each Y is independently selected from Image , Image , or -OR, R is a group containing at least one olefinically unsaturated group, R' is hydrogen, alkyl to C25, aryl, or R, n is 1 to 4, and the number of olefinic groups in Y is at least 3 when each Y is Image and otherwise is at least 2. Photosensitive polyamic acids and polyimides can be prepared from the aromatic diamines which can be crosslinked with light to a mask to form patterns on a substrate.
Choi Jin-O
Rosenfeld Jerold
Tang David Y.
Tyrell John
Occidental Chemical Corporation
Swabey Ogilvy Renault
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