Diamond membranes for x-ray lithography

Details Diamond membranes for x-ray lithography Diamond membranes for x-ray lithography

G - Physics

03

F

G03F 1/14 (2006.01) C23C 16/26 (2006.01) C23C 16/27 (2006.01) C30B 29/04 (2006.01) G21K 1/10 (2006.01)

Patent

CA 2112477

2112477 9300685 PCTABS00019 A substantially compressive stress-free, pinholes free, and defects free continuous polycrystalline diamond membrane for an x-ray lithography mask is produced by placing a prepared substrate (22) into a hot filament chemical vapor deposition reaction chamber (100), pre-heating the substrate to 400 ·C-650 ·C in the presence of an inert gas, heating the substrate to 650 ·C-700 ·C in the presence of hydrogen and carbon compounds (61), and chemically vapor depositing a polycrystalline diamond membrane onto the substrate.

Affiliated with

Also associated with

Rating

Diamond membranes for x-ray lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Diamond membranes for x-ray lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Diamond membranes for x-ray lithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1721213