C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
260/613, 260/614
C07F 5/02 (2006.01) C07C 17/00 (2006.01) C07C 25/18 (2006.01) C07C 205/12 (2006.01) C07F 9/00 (2006.01) C07F 15/02 (2006.01) C08K 5/04 (2006.01)
Patent
CA 1218668
DIARYLIODOSYL SALTS ABSTRACT New diaryliodosyl salts have the formula Image IV where R7 and R8, which may be the same or different, each represent phenyl, naphthyl or said phenyl or said naphthyl substituted by one or two groups selected from the group consisting of alkoxy of 1 to 4 carbon atoms, alkyl of 1 to 4 carbon atoms, phenyl, nitro and halogen, Zt- denotes a t-valent anion of formula MXn- or R9SO3- or is a t-valent anion selected from the group consisting of phosphate, hydrogenphosphate, dihydrogenphosphate, sulfate and hydrogensulfate, t is 1, 2 or 3, M represents antimony, bismuth, tin, boron, iron, arsenic or phosphorus, X denotes a halogen atom, n is 4, 5, or 6 and is one more than the valency of M, with the proviso that, when M represents antimony, n is 6, and five of the symbols X each represent a fluorine atom, then one X represents a fluorine atom or a hydroxo group, and R9 represents methyl, trifluoromethyl, phenyl or said phenyl substituted by alkyl of 1 to 4 carbon atoms or by halogen, have util- ity as photocuring catalysts for cationically polymerisable materials such as epoxide resins and phenolic resins.
436854
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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