C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/578.2, 260/4
C07C 291/02 (2006.01)
Patent
CA 1299188
RD-17148 DIARYLNITRONES Abstract of the Disclosure Diarylnitrones having the following formula are useful for near UV photolithography: Image where X is an electrom withdrawing group in the para position selected from the class consisting of -?-OR7 , -?-R7 , -?N(R7)2 , -CN , halogen, and R7 is a C(1-8) alkyl radical.
561102
Griffing Bruce Frederick
West Paul Richard
Gowling Lafleur Henderson Llp
Microsi Inc.
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