C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
96/161, 260/179,
C08G 65/06 (2006.01) C07D 295/12 (2006.01) G03C 1/54 (2006.01) G03C 1/56 (2006.01)
Patent
CA 1175811
ABSTRACT OF THE DISCLOSURE Provided are novel light-sensitive diazonium compounds known as diazonium trifluoromethane sulfo- nates, which have the structural formula: Image wherein Image is the cation of an organic diazonium compound. The diazonium trifluoromethane sulfonates are prepared as the reaction product of trifluoromethyl sulfonic acid, or a salt thereof, and a diazonium compound. Said diazonium trifluoromethane sulfonates find utility in diazography formulation for both positive- and negative-working diazotype photoreproduc- tion systems, and as latent polymerization initiators activatable by irradiation.
390217
James River-Graphics Inc.
Swabey Ogilvy Renault
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