C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/255, 260/266
C07D 403/04 (2006.01) C07C 59/68 (2006.01) C07C 59/70 (2006.01) C07C 63/70 (2006.01) C07C 65/21 (2006.01) C07C 65/24 (2006.01) C07C 205/56 (2006.01) C07D 295/04 (2006.01) C07D 313/14 (2006.01) C07D 405/04 (2006.01) C07D 405/14 (2006.01) C07D 413/14 (2006.01)
Patent
CA 1055025
Abstract Tricyclic compounds of the general formula Image I wherein R represents a lower alkyl, lower alkenylalkyl or lower alkynylalkyl group, which groups may be substituted by cyano, hydroxy or alkanoyloxy in the case where they are other than the methyl group, or R repre- sents a group of the formula Image (a) in which X represents an oxygen or sulphur atom or an imino, lower alkylimino or methylene group, Y represents an ethylene or propylene group which may be substituted by lower alkyl and m stands for zero or 1; and wherein one of the symbols R1 and R2 represents a hydrogen atom and the other symbol represents a halogen atom or a lower alkyl, lower alkoxy, lower alkylthio, trifluoromethyl or hydroxy group.
217252
Gerecke Max
Kaplan Jean-Pierre
Kyburz Emilio
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