C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/276.1, 260/3
C07D 495/04 (2006.01) C07D 313/14 (2006.01) C07D 337/14 (2006.01) C07D 491/04 (2006.01)
Patent
CA 1122599
ABSTRACT OF THE DISCLOSURE Acetic acid derivatives having the formula, Image wherein X represents an oxygen or two hydrogen atoms, Y re- presents CH or N, A represents an oxygen or sulfur atom, and R represents hydroxy, amino or a lower alkoxy group having 1 to 5 carbon atoms possess excellent antiinfammatory activi- ties.
322446
Fujimoto Yasuo
Yamabe Shigeru
Gowling Lafleur Henderson Llp
Nippon Chemiphar Co. Ltd.
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