C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/328.4
C07D 333/76 (2006.01)
Patent
CA 1104144
RAN 4001/96 Abstract The invention relates to compounds of the formula Image 1 wherein R is hydrogen, halogen, hydroxy, cyano, lower alkyl, hydroxy-lower alkyl, lower alkoxy, acyl, benzyloxy, lower alkyl- thio, trifluoromethyl, nitro, amino, mono- lower alkylamino, di-lower alkylamino, sulfamoyl, di-lower alkylsulfamoyl or difluoromethylsulfonyl; R1 is halogen, cyano, lower alkyl, hydroxy-lower alkyl, lower alkoxy, acyl, acylamido, benzyloxy, lower alkylthio, trifluoromethyl, hydroxy, nitro, amino, mono-lower alkylamino, di-lower alkyl- amino, sulfamoyl, di-lower alkylsulfamoyl or difluoromethylsulfonyl, or R taken together with an adjacent R1 is also lower alkylenedioxy; R2 is Image wherein A is hydroxy, lower alkoxy, amino-lower alkoxy, mono-lower alkylamino-lower alkoxy or di-loweralkylamino-lower alkoxy, X and Y, independently, are hydrogen or lower alkyl, and m is 1 to 7, or R2 is Image wherein B is hydroxy, carboxy, lower alkoxy, amino, hydroxyamino, mono-lower alkylamino, di-lower alkylamino, amino-lower alkoxy, mono-lower alkylamino-lower alkoxy or di-lower alkylamino- lower alkoxy, Y and X, independently, are hydrogen or lower alkyl; and n is 1 to 7; when X and Y are different, their enantiomers; when B is hydroxy or carboxy, salts thereof with pharmaceutically acceptable bases; and when R or R1 is amino, mono-lower alkyl- amino or di-lower alkylamino, and/or when B or A is amino- lower alkoxy, mono-lower alkylamino-lower alkoxy or di-lower alkylamino-lower alkoxy, addition salts thereof with pharmaceutically acceptable acids prepared inter alia, from the correspondingly substituted thiophenol and haloketo- cyclohexane are described. The dibenzothiophenes of the invention are useful antiinflammatory, analgesic and antirheumatic agents.
274592
Berger Leo
Plati John T.
Ziering Albert
Gowling Lafleur Henderson Llp
Hoffmann-La Roche Limited
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