C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 263/34 (2006.01) C07C 229/16 (2006.01) C07C 229/36 (2006.01) C07C 237/20 (2006.01) C07C 323/60 (2006.01) C07D 209/20 (2006.01) C07D 233/90 (2006.01) C07D 277/56 (2006.01) C07D 403/12 (2006.01) C07D 409/12 (2006.01) C07D 413/12 (2006.01) C07D 417/12 (2006.01)
Patent
CA 2071659
Abstract: Disclosed are a dicarboxylic acid compound represented by the formula (I): Image (I) wherein R represents hydrogen atom, a lower alkyl group, phenyl group or hydroxyl group; R1 represents a straight or branched alkyl group having 1 to 10 carbon atoms or a lower alkyl group substituted by a group selected from aryl group, a sulfur- or nitrogen-con- taining heterocyclic monocyclic group and a cycloalkyl group having 4 to 8 carbon atoms; R2 represents a sub- stituted or unsubstituted aryl group, a cycloalkyl group having 4 to 8 carbon atoms or a sulfur-contain- ing or nitrogen-containing heterocylcic group; X represents sulfur atom, oxygen atom or a substituted or unsubstituted imino group; y1 represents imino group, oxygen atom or sulfur atom and y2 represents nitrogen atom, or yl represents a vinylene group and y2 represents a group: -CH=; m represents U to 3; and n represents O or 1, an ester thereof or pharmaceutically acceptable salts thereof, and a process for preparing the same.
Iwasaki Tameo
Matsumoto Kazuo
Nunami Ken-Ichi
Yamaguchi Isao
Yano Koji
Marks & Clerk
Tanabe Seiyaku Co. Ltd.
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