C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 1/08 (2006.01) C07F 7/08 (2006.01) H05K 3/10 (2006.01)
Patent
CA 2490773
The invention relates to dicopper(I)oxalate complexes that are stabilized by neutral Lewis base units and the use thereof as precursors for metallic copper deposition. The neutral Lewis bases used are alkines or alkenes containing at least one silyl or ester group, or nitriles, saturated and unsaturated nitrogen ligands, phosphites, trialkylphosphines, oxygen- and sulfur- containing ligands.
L'invention se rapporte à des complexes oxalate de dicuivre(I) qui sont stabilisés par des unités structurales de type bases de Lewis neutres, ainsi qu'à leur utilisation en tant que précurseurs pour déposer du cuivre métallique. Lesdites bases de Lewis neutres employées peuvent se présenter sous la forme d'alcynes ou d'alcènes comportant au moins un groupe silyle ou ester, ou de nitriles, ligands azotés saturés ou insaturés, phosphites, trialkylphosphines, ainsi que de ligands oxygénés et soufrés.
Koehler Katrin
Meyer Franc
Basf Aktiengesellschaft
Fetherstonhaugh & Co.
Merck Patent Gesellschaft Mit Beschraenkter Haftung
LandOfFree
Dicopper(i)oxalate complexes as precursor substances for the... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Dicopper(i)oxalate complexes as precursor substances for the..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dicopper(i)oxalate complexes as precursor substances for the... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1674502