Dicyclohexylmethane diisocyanate residue-based compositions...

C - Chemistry – Metallurgy – 08 – G

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C08G 18/75 (2006.01) C08G 18/10 (2006.01) C08G 18/28 (2006.01) C08G 18/40 (2006.01) C08G 18/48 (2006.01) C08G 18/72 (2006.01) C08K 5/04 (2006.01)

Patent

CA 2223465

Urethane-filled compositions are produced by reacting a dicyclohexylmethane diisocyanate residue or a dicyclohexylmethane diisocyanate residue containing mixture with a monofunctional alcohol containing at least one ether group in an amount such that the equivalent ratio isocyanate groups to hydroxyl groups is from about 0.9:1 to about 1:0.9. The diisocyanate residue or residue-containing mixture must contain at least 20% by weight monomeric diisocyanate and have a total NCO content of at least 10%. The diisocyanate residue is produced by phosgenating dicyclohexylmethane diamine in which less than 20% polymeric diamine is present. The urethane filled compositions produced in this manner may then be dissolved in either a polyol or a polyisocyanate and subsequently used to produce polyurethanes in known manner.

On produit des préparations contenant un uréthane en faisant réagir un résidu dicyclohexylméthane-diisocyanate ou un mélange contenant un résidu dicyclohexylméthane- diisocyanate avec un alcool monofonctionnel contenant au moins un groupe éther, en une quantité telle que le rapport équivalent groupes isocyanate/groupes hydroxyle est compris entre environ 0,9/1 et environ 1/0,9. Le résidu diisocyanate ou le mélange contenant le résidu diisocyanate doit renfermer au moins 20 % en poids d'un diisocyanate monomérique et présenter une teneur totale en NCO d'au moins 10 %. Le résidu diisocyanate est obtenu en procédant à la phosgénation de la dicyclohexylméthane-diamine contenant moins de 20 % de diamine polymérique. Les préparations contenant de l'uréthane obtenues avec ce procédé peuvent être dissoutes dans un polyol ou dans un polyisocyanate, puis utilisées ultérieurement pour produire des polyuréthanes par les méthodes connues.

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