Dielectric drying kiln material handling system

F - Mech Eng,Light,Heat,Weapons – 26 – B

Patent

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Details

F26B 3/347 (2006.01) F26B 5/04 (2006.01) F26B 7/00 (2006.01) F26B 15/12 (2006.01) H05B 6/58 (2006.01)

Patent

CA 2343300

A dielectric drying kiln material handling system includes a bottom electrode (14) incorporating a conveyor system (17) for moving material (64) along said bottom electrode for moving material on and off of the electrode. Conveyors are built into the electrode in a manner so that the electrode surface of the bottom electrode (14) i.e. the surface contacting material (64) to be dried is configured with gaps (1.6) having dimensions so that the gaps do not significantly affect the uniformity of the power distribution over the electrode surface. Various types of conveyors may be used such as slat conveyors, roller conveyors, belt conveyors and the like provided the gaps, i.e. between the slats receiving the rollers (2.1) or for accommodating the return rollers belt type conveyor are configured with dimensions so that the gaps do not significantly affect the uniformity of electromagnetic field and power distribution over the effective surface of the bottom electrode.

L'invention porte sur un système de manutention des matériaux pour four à séchage diélectrique comportant une électrode de fond (14) munie de convoyeurs (17) déplaçant les matériaux le long de l'électrode pour les y amener ou les en retirer. Les convoyeurs sont intégrés à l'électrode (14) de manière à ce que sa surface, en contact avec les matériaux (64) à sécher présente des vides (1.6) calculés pour que leurs dimensions n'influent pas significativement sur l'uniformité de la distribution de la puissance à la surface de l'électrode. On peut utiliser plusieurs types de convoyeurs, a palettes, à rouleaux, à bande, etc., à condition que les vides, c.-à-d. l'espace entre les palettes recevant les rouleaux (2.1), ou les convoyeurs à bande et rouleaux de renvoi aient des dimensions telles que ces mêmes vides n'influent pas significativement sur l'uniformité de la distribution du champ électromagnétique et de la puissance sur la surface efficace de l'électrode de fond.

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