Diffraction grating and manufacturing method thereof

Details Diffraction grating and manufacturing method thereof Diffraction grating and manufacturing method thereof

G - Physics

02

B

26/197, 88/0.1

G02B 5/18 (2006.01)

Patent

CA 1321495

61954-14 ABSTRACT OF THE DISCLOSURE A diffraction grating has a reflection film formed on a photosensitive layer disposed on a substrate through exposure followed by development and the groove profile thus formed has a configuration distorted from a sinusoidal form because the sensitivity curve of the photosensitive layer is of the second order non-linearity to the exposure amount. With the groove pitch expressed by d, K = 2 .pi./d, the coordinate perpendicular to the groove direction taken as x, and the groove profile .pi.(x) expressed as .pi.(x) = h [sin (Kx) + .gamma.sin (2Kx - 90°)], the parameters h, .gamma. and .PHI. satisfy as follows: 0.26 ? 2h/d ? 0.52 0.05 ? .gamma. ? 0.32. The wavelength region to be used is normalized by the groove pitch d as 0.67 ? .lambda./d ? 1.1.5. When an incident angle is expressed by .THETA. and the first order Littrow angle is expressed by .THETA.L, the amount to be used is carried out in such a region that satisfies the following expression: .THETA.L - 5° ? .THETA. ? .THETA.L + 5°.

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