Diffraction grating-fabricating phase mask, and its...

Details Diffraction grating-fabricating phase mask, and its... Diffraction grating-fabricating phase mask, and its...

G - Physics

03

F

G03F 1/00 (2006.01) G02B 5/18 (2006.01) G03F 1/08 (2006.01)

Patent

CA 2283403

The invention relates to a diffraction grating-forming phase mask which can make the diffraction grating to be formed substantially free of any defect, even when foreign matters or resins, etc. sublimed from an optical fiber are deposited on the surface of the phase mask. The phase mask 21 comprises a substrate and a grating form of repetitive groove (26)-and-strip (27) pattern for forming a diffraction grating by interference fringes of diffracted light through the repetitive pattern. An optically transparent protective layer 30 is applied over the surface of the substrate with the repetitive groove (26)-and-strip (27) pattern formed thereon.

L'invention concerne un masque de phase destiné à s'utiliser dans la fabrication d'un réseau de diffraction, le masque de phase n'étant pas susceptible de provoquer des défauts sur les réseaux de diffraction même lorsqu'il transporte de la poussière ou des particules de plastique sublimées à partir de fibres optiques. Le masque de phase (21) comprend des motifs croisés alternés de creux (26) et d'arêtes (27) formés d'un côté d'une plaque transparente pour produire un réseau de diffraction en fonction des lignes d'interférence produites par des rayons diffractés à partir des motifs. La surface du côté présentant les motifs en alternance de creux (26) et d'arêtes (27) est revêtue d'une couche de protection (30) à transparence optique.

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