Diffusion-plasma-assisted chemical treatment apparatus

Details Diffusion-plasma-assisted chemical treatment apparatus Diffusion-plasma-assisted chemical treatment apparatus

C - Chemistry, Metallurgy

23

C

204/181

C23C 16/50 (2006.01) C23C 16/54 (2006.01) H01J 37/32 (2006.01) H05H 1/02 (2006.01)

Patent

CA 2027883

- 18 - DESCRIPTIVE ABSTRACT Diffusion plasma-assisted chemical treatment apparatus. The apparatus comprises a tight treatment enclosure (10), means (20,22) for the axial production of a carrier gas plasma, a solid plate (30) serving as an obstacle to the plasma and located per- pendicular to the enclosure axis and downstream of the plasma production means, plasma diffusion means (40) located downstream of the obstacle plate, several non-ionized vector gas supply tubes (50) issuing axially into the enclosure beneath the diffusion means and all located in the same plane around the enclosure axis, a substrate carrier (56) positioned downstream of the vector gas supply tubes and perpendicular to the axis and annular pumping means (66,16) for the gaseous medium contained in the enclosure and positioned downstream of the substrate carrier. (fig. 2). B 10071.3 LC

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