C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 43/225 (2006.01) C07C 69/75 (2006.01) C07C 69/76 (2006.01) C07C 255/54 (2006.01) C07C 255/55 (2006.01) C07D 239/26 (2006.01) C07D 319/06 (2006.01) C09K 19/20 (2006.01) C09K 19/30 (2006.01) C09K 19/34 (2006.01) C09K 19/42 (2006.01) C09K 19/44 (2006.01) C09K 19/46 (2006.01)
Patent
CA 2202349
In order to provide novel compounds which are useful as liquid crystal materials for low voltages in several liquid crystal displays, have a large dielectric anisotropy, and are low in viscosity; and to improve characteristics of liquid crystal compositions, difluorooxymethane derivatives expressed by the following general formula (I) and liquid crystal compositions containing the compound are proposed (see formula I) wherein each of ~, m, and n is 0 or 1, rings A1 to A3 independently represent six-membered rings such as trans-2,4- cyclohexylene and 1,4-phenylene, Z1 to Z3 independently represent a bonding group such as covalent bond and -CH2CH2-, L1 to L4 independently represent.hydrogen atom or halogen atom, and X represents a group such as halogen atom and OCF3. They are useful as liquid crystal materials for low voltages in several modes such as active matrix mode and STN mode.
La présente invention concerne un dérivé difluoroxyméthane représenté par la formule générale (I). Ce dérivé, caractérisé par une faible viscosité et une anisotropie à haute permittivité, s'utilise avantageusement comme substance à cristaux liquides basse tension pour divers types d'afficheurs à cristaux liquides. Dans cette formule générale (I), l, m et n représentent chacun 0 ou 1. Les noyaux A1 à A3 représentent chacun indépendamment des noyaux à 6 segments tels que le trans-1,4-cyclohexylène ou le 1,4-phénylène. Z1 à Z3 représentent chacun indépendamment une liaison covalente ou un groupe de liaison tel que -CH2CH2-. L1 à L4 représentent chacun hydrogène ou halogéno, et X représente halogéno, OCF3, etc. Ce composé est utile comme substance à cristaux liquides basse tension en divers modes, y compris les systèmes à matrice active et les systèmes nématiques en superhélice (STN).
Goto Yasuyuki
Haseba Yasuhiro
Matsui Shuichi
Miyazawa Kazutoshi
Nakagawa Etsuo
Chisso Corporation
Jnc Corporation
Macrae & Co.
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