C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/244, 260/356
C07D 311/22 (2006.01) A61K 31/35 (2006.01)
Patent
CA 1281030
RAN 4050/24 Abstract It has been found that the novel compounds of the formula Image I wherein R1 is hydrogen or lower alkyl, R2 is hydrogen or halogen, R3 is hydrogen or lower alkyl. R4 is hydrogen or lower alkyl, R5 is hydrogen, lower alkyl or aralkyl, X is alkylene and n is an integer from 1 to 6, the enantiomers thereof and, when R5 is hydrogen, the salts thereof with pharmaceutically acceptable bases have antiallergic properties and can accordingly be used as medicaments for the treatment or prevention of allergic conditions. The compounds of formula I can be manufactured by reacting a compound of the formula Image II with a compound of the formula Image III and optionally hydrolyzing the compound thus obtained.
518504
Cohen Noal
Weber Giuseppe F.
F. Hoffmann-La Roche Ag
Gowling Lafleur Henderson Llp
Roche Holding Ltd.
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