Diketohexanoic acids and 2- and 3-diloweralkyl derivatives...

Details Diketohexanoic acids and 2- and 3-diloweralkyl derivatives... Diketohexanoic acids and 2- and 3-diloweralkyl derivatives...

C - Chemistry, Metallurgy

07

D

260/295, 260/515

C07D 231/12 (2006.01) C07C 45/59 (2006.01) C07C 49/76 (2006.01) C07C 49/82 (2006.01) C07C 59/76 (2006.01) C07C 59/88 (2006.01) C07C 62/22 (2006.01) C07C 62/38 (2006.01) C07C 65/32 (2006.01) C07C 65/34 (2006.01) C07D 213/79 (2006.01)

Patent

CA 1341424

The acids and derivatives are represented by the following formulae: (see formula I) wherein R3 and R4 are the same or different and are individually selected from hydrogen, lower alkyl, lower alkoxy, amino, acetamido, phenyl, halo, hydroxy, lower alkyl.sulfonyl, lower alkylthio, nitro, trifluoromethyl, co-trifluoromethyl lower alkoxy, or taken together with the phenyl group to which they are attached, form naphthyl or substi- tuted naphthyl group which may be substituted with any of lower alkoxy, dilower alkoxy, phenyl, carboxymethyl, carboxy biphenyl, naphthyl, pyridyl, thienyl, and CH(aryl)CH2C(O)R9 wherein the aryl group is selected from phenyl, and substituted phenyl wherein the substituent is halo, lower alkyl or lower alkoxy, biphenyl, naphthyl, pyridyl, furyl or thienyl, R9 is selected from hydroxy, -OR10 or -N(OH)R10 where n Et10 is blower al kyl; R7 and R8 are hydrogen cycloalkyl car lower alkyl, and alkali metal salts thereof; (see formula II) wherein R3 and R4 aria as defined above and at least one of R5, R6, R7, and R8 is lower alkyl; (see formula III) wherein R3 and R4 are as defined above and R is phenyl, substituted phenyl., pyridyl, substituted pyridyl, cyclohexyl, cyclohexenyl, or 7-oxobicy- clo[2.2.1]heptenyl, These compounds are intermedi- ates for the preparation of pharmacologically active 2- and 3- substituted (1',5'-diaryl-3-pyrazolyl)-N- hydroxypropanamides.

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