C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 33/48 (2006.01)
Patent
CA 2313002
A compound of formula (II), wherein R1 is chlorine, fluorine or trifluoromethyl; R2 is hydrogen, chloride, fluorine or trifluoromethyl; and R is hydrogen or a protective group of the hydroxy moiety useful as intermediate for the synthesis of antimycotic azole compounds.
L'invention porte sur un composé de la formule (II) dans laquelle R¿1? représente chlore, fluor ou trifluorométhyle; R¿2? représente hydrogène, chlorure, fluor ou trifluorométhyle; et R représente hydrogène ou un groupe protecteur de la fraction hydroxy utilisé comme intermédiaire dans la synthèse des composés azole antimycosiques.
Belli Aldo
Continanza Biase
Grancini Giancarlo
Napoletano Mauro
Villa Marco
Riches Mckenzie & Herbert Llp
Zambon Group Spa
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