C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
149/23
C11D 7/08 (2006.01) C11D 7/24 (2006.01) C11D 11/00 (2006.01)
Patent
CA 1175736
DIPHASE DRAIN CLEANER ABSTRACT OF THE DISCLOSURE A diphase drain cleaning composition and method wherein the composition has two liquid layers. The lower denser layer makes up from 50 to 99 percent of the total composition weight while the upper less-dense layer makes up from 1 to 50 percent of the total composition weight. The lower layer consists of at least 20 percent sulphuric acid solution. The upper layer consists of an aromatic hydrocarbon such as benzene, toluene, zylene, trimethyl- benzene or monochlorotoluene. The composition attacks drain blockage consisting of polystyrene and other organic and inorganic matter in two phases. First, the lower layer of sulphuric acid contacts the blockage and melts and dissolves many organic and inorganic materials. Second, loosened polystyrene, which is not affected by the sulphuric acid, floats to the upper layer where it is dissolved by the solvent making up the upper layer.
419216
Hysan Corporation
Meredith & Finlayson
LandOfFree
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