C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/350, 71/7, 2
C07D 309/12 (2006.01) A01N 41/10 (2006.01) A01N 43/02 (2006.01) A01N 43/08 (2006.01) A01N 43/16 (2006.01) A01N 43/28 (2006.01) A01N 57/14 (2006.01) C07D 307/33 (2006.01) C07D 317/22 (2006.01) C07F 9/12 (2006.01)
Patent
CA 1227491
- 1 - Abstract: The invention provides diphenyl sulfone compounds of the formula: (I) Image wherein R1 and R2, which may be the same or different, each represents a hydrogen atom, a halogen atom, a lower alkyl group, a lower alkoxy group, a lower alkenyloxy group, a lower alkynyloxy group, a phenoxy group a lower alkylthio group, a lower alkylsulfonyl group or a lower alkoxycarbonyl(lower)alkoxy group, R3 is a hydroxyl group, a lower alkenyloxy group, a lower alkynyloxy group, a halo(lower)alkoxy group, a dihalo(lower)alkoxy group, a lower alkoxyclower)alkoxy group, a cyano(lower)alkoxy group, a lower alkoxycyano(lower)alkoxy group, a hydroxy- (lower)alkoxy group, a lower alkylcarbonyloxy group, a lower alkoxycarbonyl group, a lower alkylthio(lower)alkoxy group, a lower alkenyloxy(lower)alkoxy group, a di(lower)- alkylamino(lower)alkoxy group, a hydroxyimino(lower)alkoxy group, a lower alkoxyimino(lower)alkoxy group, a lower alkylsulfonyloxy group, a lower alkoxycarbonyloxy group, a di(lower)alkoxyphosphinyloxy group, an oxotetrahydro- furanyloxy group, a tetrahydropyranyloxy group, a lower alkyl-1,3-oxolanyl(lower)alkoxy group or a group of the -2- formula: -O-A-COR4 (in which A is lower alkylene, lower alkenylene, lower alkyleneoxy, halo(lower)alkylene or lower alkoxy(lower)alkylene and R4 is hydroxyl, lower alkyl, halo(lower)alkyl, lower alkoxy, lower alkenyloxy, loweralkynyloxy, halo(lower)alkoxy, lower alkoxy(lower)- alkoxy, cyano(lower)alkoxy, lower alkoxycarbonyl(lower)- alkoxy, di(lower)alkylamino, N-( -lower alkyl(lower)- alkylidene)-aminoxy or lower alkylthio) and X is a hydrogen atom or a halogen atom. These compounds are useful as selective herbicides.
427763
Hino Naganori
Konishi Hiroyuki
Matsumoto Hiroshi
Yoshida Ryo
Kirby Eades Gale Baker
Sumitomo Chemical Co. Ltd.
LandOfFree
Diphenyl sulfone compounds, and their production and use does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Diphenyl sulfone compounds, and their production and use, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Diphenyl sulfone compounds, and their production and use will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1195224