C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
260/613
C07F 9/547 (2006.01) C07D 347/00 (2006.01) C07F 9/68 (2006.01) C07F 9/92 (2006.01)
Patent
CA 1283425
ABSTRACT OF THE DISCLOSURE Cationic polymerization of a variety of organic materials such as vinyl monomers, prepolymers, cyclic ethers, cyclic esters and organosilicon cyclics can be achieved by the use of certain radiation sensitive aromatic halonium salts. In addition, polymerizable compositions are provided which can be used as coating compounds, molding resins, adhesives etc. The salts have the general formula [(R1) I] + [MF6] - where M is an element selected from the class consisting of P, As and Sb, R1 is a divalent aromatic organic radical selected from Image and Image where n is an integer.
314333
Company General Electric
Oldham And Wilson
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