C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 277/44 (2006.01) C07D 277/46 (2006.01)
Patent
CA 2105665
Novel diphenylthiazole derivatives having the following general formula (I): (see fig. I) (I) wherein m and n are independently 1 or 2; R1 and R~ each represent a hydrogen atom, a lower alkyl group, a lower alkoxy group, a lower alkylsulfenyl group, a nitro group, an amino group, a methanesulfonyloxy group or a halogen atom; A1 represents a lower alkanesulfonyl group, a halogenated lower alkanesulfonyl group, or a halogenated or haloalkylated benzenesulfonyl group; and A~ represents a hydrogen atom, a lower alkanesulfonyl group, a halogenated lower alkanesulfonyl group, or a lower alkyl group; and pharmaceutically acceptable salts thereof; are efficacious as drugs having antiinflammatory, analgesic, antiallergic, uricosuric or platelet aggregation inhibiting effects.
ouveaux dérivés diphénylthiazole dont la formule générale est la suivante (I) : (voir fig. I) (I) où m et n sont indépendamment 1 ou 2; R1 et R
Deguchi Yoshiki
Fujimoto Noriyuki
Ikesue Kouichi
Inoue Hisataka
Minami Hidenao
Hisamitsu Pharmaceuticals Co. Inc.
Swabey Ogilvy Renault
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