Direct write nanolithographic deposition of nucleic acids...

Details Direct write nanolithographic deposition of nucleic acids... Direct write nanolithographic deposition of nucleic acids...

G - Physics

01

N

G01N 1/10 (2006.01) B01J 19/00 (2006.01) B01L 3/00 (2006.01) B01L 3/02 (2006.01) B05D 5/00 (2006.01) B82B 3/00 (2006.01) C12Q 1/68 (2006.01) G01N 1/00 (2006.01) G01N 15/06 (2006.01)

Patent

CA 2468743

The use of direct-write nanolithography to generate anchored, nanoscale patterns of nucleic acid on different substrates is described, including electrically conductive and insulating substrates. Modification of nucleic acid, including oligonucleotides, with reactive groups such as thiol groups provides for patterning with use of appropriate scanning probe microscopic tips under appropriate conditions. The reactive groups provide for chemisorption or covalent bonding to the substrate surface. The resulting nucleic acid features, which exhibit good stability, can be hybridized with complementary nucleic acids and probed accordingly with use of, for example, nanoparticles functionalized with nucleic acids. Patterning can be controlled by selection of tip treatment, relative humidity, and nucleic acid structure.

L'invention concerne l'utilisation de la nanolithographie par ~criture directe destin~e ~ produire des motifs nanom~triques ancr~s d'acide nucl~ique sur diff~rents substrats, notamment des substrats ~lectroconducteurs et isolants. La modification d'un acide nucl~ique, notamment d'oligonucl~otides, avec des groupes r~actifs de type thiol permet de former des motifs au moyen de pointes de microscope sonde ~ balayage appropri~es dans des conditions appropri~es. Les groupes r~actifs permettent une chimisorption ou une liaison covalente sur la surface du substrat. Les structures d'acide nucl~ique obtenues qui pr~sentent une bonne stabilit~, peuvent Útre hybrid~es avec des acides nucl~iques compl~mentaires et sond~es en cons~quence, par exemple au moyen de nanoparticules fonctionnalis~es avec des acides nucl~iques. La mod~lisation peut Útre ma¹tris~e par une s~lection du traitement des pointes, de l'humidit~ relative, et de la structure d'acide nucl~ique.

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