Direct writing of optical devices in silica-based glass...

G - Physics – 11 – C

Patent

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G11C 13/04 (2006.01) B23K 26/00 (2006.01)

Patent

CA 2380541

The invention relates to methods of writing a light guiding structure in a bulk glass substrate. The bulk glass substrate is preferably made from a soft silica-based material having an annealing point less than about 1380 °K. Pulsed laser beam is focused within the substrate while the focus is translated relative to the substrate along a scan path at a scan speed effective to induce an increase in the refractive index of the material along the scan path. Substantially no laser induced physical damage of the material is incurred along the scan path. Various optical devices can be made using this method.

L'invention concerne des procédés d'écriture d'une structure de guidage de lumière dans un substrat en verre en vrac. Ce substrat est de préférence obtenu à partir d'une matière molle à base de silice présentant une température de recuit inférieure à environ 1380 DEG K. Un faisceau laser à impulsions est focalisé dans le substrat tandis que le foyer est déplacé par rapport au substrat le long d'un trajet de balayage à une vitesse de balayage efficace pour induire une augmentation de l'indice de réfraction de la matière le long du trajet. La matière ne subit pratiquement aucun dommage physique induit par le laser le long du trajet de balayage. Différents dispositifs optiques peut être obtenus grâce à ce procédé.

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