Directed energy assisted in vacuo micro embossing

Details Directed energy assisted in vacuo micro embossing Directed energy assisted in vacuo micro embossing

B - Operations, Transporting

29

D

B29D 11/00 (2006.01) B29C 35/08 (2006.01) B29C 35/10 (2006.01) B29C 39/14 (2006.01) B29C 59/04 (2006.01) B32B 3/00 (2006.01) G02B 5/18 (2006.01) G03F 7/00 (2006.01) G03H 1/02 (2006.01) G11B 7/26 (2006.01)

Patent

CA 2328868

Various configurations of a directed energy assisted micro embossing machine/station in a vacuum chamber (7) utilized in a continuous manufacturing process and the web structure products (4) made by that process (optical disks, cards, tapes, holographic reflectors, diffusers, binary optical elements, etc.) are disclosed. The configurations can include a single machine roll to roll system (2, 3) for embossing optical features on the surface of a single substrate (4) and applying appropriate metallic, dielectric, semiconductor, polymer and other coatings all in a vacuum chamber (7).

L'invention concerne différentes configurations d'une machine/poste de micro-emboutissage assisté par énergie dirigée dans une chambre sous vide (7) utilisée dans le procédé de fabrication et les produits de structure de bande (4) obtenus par ce procédé (disques optiques, cartes, bandes, réflecteurs holographiques, diffuseurs, éléments optiques binaires, etc.). Ces configurations peuvent comprendre un seul rouleau de machine pour entraîner le système (2, 3) permettant d'emboutir les motifs optiques sur la surface d'un seul substrat (4) et d'appliquer les revêtements adéquats, notamment métallique, diélectrique, semi-conducteur, polymère dans une chambre sous vide (7).

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