Discharge device and method for use in processing...

H - Electricity – 01 – L

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

356/176

H01L 21/44 (2006.01) H01L 21/027 (2006.01)

Patent

CA 1118535

The present invention relates to an apparatus and method for making electrical connections between a conductive region through an insulating layer and more particularly to a method for use in the manufacture of semiconductor devices which prevents charge accumulation during exposure by a charged beam.

312138

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Discharge device and method for use in processing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Discharge device and method for use in processing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Discharge device and method for use in processing... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-778815

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.