Distortion resistant, high-definition litho applique

Details Distortion resistant, high-definition litho applique Distortion resistant, high-definition litho applique

D - Textiles, Paper

06

H

D06H 1/02 (2006.01) B41M 5/035 (2006.01)

Patent

CA 2676197

A process for creating and applying a soft, high-definition, complex shaped appliqué such that the shape of the appliqué is not distorted when stitched onto a garment and the appliqué can optionally be embroidered without requiring additional alignment processes. The appliqués are made by sublimating a high-definition image onto an upper fabric capable of retaining the high-definition image, affixing the upper fabric to a soft backing fabric capable of resisting dimensional distortion, and then laser cutting the complex shape such that the resulting appliqué can be stitched onto a garment.

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