C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 235/78 (2006.01) A61K 31/195 (2006.01) A61K 31/33 (2006.01) C07C 233/11 (2006.01) C07C 233/51 (2006.01) C07C 311/51 (2006.01) C07C 317/32 (2006.01) C07C 323/41 (2006.01) C07D 207/337 (2006.01) C07D 209/08 (2006.01) C07D 213/56 (2006.01) C07D 257/04 (2006.01) C07D 307/54 (2006.01) C07D 333/24 (2006.01)
Patent
CA 2092306
Monocyclic and bicyclic aryl ring compounds having selective LTB4 antagonist properties and comprising two ring substituents, the first substituent comprising a lipophilic group and a terminal carboxylic acid or derivative group, and the second substituent comprising an amido group, therapeutic compositions and methods of treatment of disorders which result from LTB4 activity using the mono- and bicyclic. aryl compounds are disclosed.
Chan Wan K.
Chang Michael N.
Galemmo Robert A. Jr.
Huang Fu-Chih
Sutherland Charles
Aventisub II Inc.
Goudreau Gage Dubuc
Rhone-Poulenc Rorer International (holdings) Inc.
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