C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 339/08 (2006.01) A61K 31/385 (2006.01) C07D 409/02 (2006.01) C07D 409/04 (2006.01) C07D 409/12 (2006.01)
Patent
CA 2074062
RAN 4060/159 Abstract Compounds of the formula Image I wherein R signifies a residue of the formula Image , Image or Image , (a) (b) (c) and R1, R2, R3, R4, R5, R6, R7, X, Y and Z have the significance given in claim 1, with the exception of rac-N-(3,4-dimethoxy- phenethyl)-2-(3,4-dimethoxyphenyl)-.beta.,N-dimethyi-m-dithiane-2- propylamine, as well as their acid addition salts have outstanding properties against multi-resistant malignant tumour cells and against chloroquine resistance, and are accordingly suitable for reducing and/or eliminating multiple resistance to cytostatics in the treatment of tumours or for reducing and/or eliminating chloroquine resistance in the treatment of malaria.
Eliason James F.
Kaufmann-Schmid Franz A.
Ramuz Henri
F. Hoffmann-La Roche Ag
Gowling Lafleur Henderson Llp
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