Doped precipitated silica

Details Doped precipitated silica Doped precipitated silica

C - Chemistry, Metallurgy

01

B

C01B 33/187 (2006.01) B41M 5/52 (2006.01) C01B 33/12 (2006.01) C01B 33/193 (2006.01) C08K 3/36 (2006.01) D21H 19/40 (2006.01)

Patent

CA 2364996

The invention relates to foreign-atom-doped precipitated silicas having a BET surface area of more than 300 m2/g and a maximum surface concentration of the foreign atoms of 0.05 mmol/m2, to a process for preparing them and to the use of the resulting precipitated silicas in papermaking.

Affiliated with

Also associated with

Rating

Doped precipitated silica does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Doped precipitated silica, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Doped precipitated silica will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-2065264