Dot-etchable photopolymerizable elements and image...

G - Physics – 03 – C

Patent

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96/150, 96/256,

G03C 3/00 (2006.01) G03F 5/00 (2006.01) G03F 7/40 (2006.01)

Patent

CA 1079565

ABSTRACT Photopolymerizable elements are described comprising a sheet support, a photopolymerizable layer having a thick- ness of, at most, 0.0006 inch (0.015 mm) and an optical density of at least 3.0 in the actinic region. Resist images made from these elements may be etched by a process of chemically undercutting the image areas and then spraying or rubbing them. The elements are useful as contact speed lithographic films and for other graphic arts applications.

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